MF198200 - SEMI MF1982 - Test Method for Analyzing Organic Contaminants on Silicon Wafer Surfaces by Thermal Desorption Gas Chromatography Revision:SEMI MF1982-0714 - Superseded 表面処理と表面清浄装置
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Description
表面処理と表面清浄装置
The procedure involves detection and measurement of the surface elemental composition by Auger electron spectroscopy (AES)
Furthermore
This Document applies only to substrate map data items
• edge roundness
MF198200 - SEMI MF1982 - Test Method for Analyzing Organic Contaminants on Silicon Wafer Surfaces by Thermal Desorption Gas Chromatography Revision:SEMI MF1982-0714 - Superseded 表面処理と表面清浄装置Organics are present in many materials, such as plastics, lubricants, cleansers, soaps, and living tissues. Some of these compounds are volatile and others can become airborne through chemical reactions, heating, abrasion, or outgassing. Organic compounds are present in many materials such as parts and components for cleanrooms, carriers, FOUP, developers, and organic removers. Some of these organic compounds are volatile and some can be discharged
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